Sputtering target comprises (Zr+Y) metallic cathode target. Sputtering deposition is conducted at (Ar+O 2) mixed gases. The O 2 is the reactive gas element. It is thought that an increase in …

Sputter deposition is the process of growing thin films from a source material known as a sputter target.It is a nonthermal vaporization process whereby the particles on the surface of the …

2024年8月1日 · Reactive sputtering on the other deals with sputtering the elemental target under a gaseous atmosphere which eventually would result in sputter compound formation by a …

2023年4月1日 · The target materials manufactured were in the same batch, and the purity was 6 N. We used the camera to take the overall picture of the target after sputtering (Fig. 3 (a)). It …

2011年7月25日 · The reactive sputtering trials were carried out at the target pulsing frequencies of 325 and 600 Hz; the pulse-on time was 50 μs (maximum allowed by the power supply) in all …

2022年7月1日 · During sputtering, the target is fully cooled by the target cooling system, and the system automatically performs the set process parameters and records the relevant process …

1999年1月1日 · Chapter 11 Sputtering Targets Simply stated, PVD is the controlled erosion and transfer of material from a target to a substrate by means of the sputtering process. The …

2021年2月1日 · The target during magnetron sputtering is generally a solid material in the form of a plate, disc or tube. Most planar targets are machined from a solid block of material. The …

2024年2月15日 · Therefore, the predicted erosion shape of the magnetron sputtering cathode target was based on the distribution of ionization. When the target potential of DC magnetron …

2023年4月1日 · The rack track profile of Ag target after sputtering was further measure by confocal microscope and the results are showed in Fig. 11. The average depth and width of …