The answer: shorter and shorter wavelengths of light. ASML’s first lithography tools created light at wavelengths of 436 nanometers. The current machines have shrunk that number to 13.5 nanometers.

X-ray lithography, which uses X-rays to expose the resist, was one of these alternatives. The idea of the XRL was first proposed by H. Smith and Spears in 1972 and gained the attention of the micro- ...

The first step is to coat a wafer with a layer ... which is seriously impressive for such a relatively simple setup. These e-beam lithography experiments follow on from [Zach]’s earlier research ...

ASML, a leading manufacturer of lithography systems, has announced its intention to deliver the industry's first EUV lithography systems to IC manufacturers in 2010. But developing a new ...

The first decade following the introduction of high-volume EUV lithography is expected to involve optimization of the process, reaching feature sizes below 10 nm. Beyond that, switching to a ...

Soft lithography is a family of non-photolithographic techniques used for fabricating micro- and nanostructures using elastomeric stamps, molds, and conformable photomasks. Unlike conventional ...