ASML is the sole producer of cutting-edge EUV lithography machines for advanced 3nm chip manufacturing. How secure is that monopoly?

EUV lithography tools consume such vast amounts of power because they rely on high-energy laser pulses to evaporate tiny tin ...

They add that the equipment is based on a laser discharge induced plasma (LDP) to produce light of 13.5nm wavelength. These reports are not confirmed. China is spending a lot of money to develop EUV ...

Hertz et al. 4 have developed a soft-X-ray/EUV microscope in the water window that achieves sub-visible-light resolution. The microscope consists of a laser-plasma source and zone-plate optics to ...

DESY's new flagship laser, KALDERA, has now made a decisive step forward: Driving the compact plasma accelerator MAGMA, the innovative laser has been shown to accelerate 100 particle bunches per ...

Laser plasma acceleration is a potentially disruptive technology: It could be used to build far more compact accelerators and open up new use cases in fundamental research, industry and health.

Few, though, are as interesting as micromachining glass with laser-induced plasma bubbles. (Video, embedded below.) The video below is from [Zachary Tong]. It runs a bit on the longish side ...