The system is equipped with an ICP RF plasma source with ion energies up to 300 eV for low energy milling of substrates up to 150mm in diameter. System also includes a 700 l/s turbopump and ...

The system is equipped with a gridded ion source positioned for uniform milling of a 200mm diameter substrate. System features a 1200 l/s turbopump, load-lock with 6-position cassette, and ...

The Focused Ion Beam (FIB) market is an integral segment within the broader landscape of semiconductor manufacturing and materials science. FIB technology has witnessed significant advancements in ...

"The TIBUSSII (Triple Ion Beam UHV System for Single Ion Implantation) is used to precisely implant individual dopants into materials, atom by atom, such as creating qubits. With a significant ...

Abstract: This paper describes the electron optics of a practical scanning electron-beam lithographic system (EL1) that provides high-volume direct wafer exposure. The throughput limitation inherent ...

Henry Siemer, of Siemer Milling Company, was honored with a plaque by the Effingham County Emergency Telephone System Board Chairman David Campbell for the company’s ongoing dedication to the ...

Jan. 15, 2025 — New observational data and simulation models have confirmed a new type of planet unlike anything found in the Solar System. This provides another piece of the puzzle to ...