Chinese chipmaking stocks soared as reports of domestic advancements in extreme ultraviolet (EUV) lithography technology emerged, signaling potential independence from U.S. sanctions ...

The Harbin Institute of Technology scientists claimed to have developed a compact and stable source of EUV light that could then be used to manufacture advanced, sub-7nm chips. Currently ...

Gudeng Precision Industrial Co (家登精密), the sole extreme ultraviolet (EUV) pod supplier to Taiwan Semiconductor Manufacturing Co (TSMC, 台積電), is aiming to expand revenue to NT$10 billion (US$304.8 ...

最后，对于中芯国际面临的技术瓶颈，王国辉承认，中国目前确实无法获得ASML的EUV光刻机，而这些设备是在尖端节点上生产芯片所需的。 然而 ...

Extreme Ultraviolet (EUV) lithography is a critical technology for manufacturing semiconductor chips smaller than 7 nanometers. For years, Dutch company ASML has maintained a global monopoly on ...

哈尔滨工业大学（哈工大）近日宣布，已成功研发出13.5奈米极紫外光（EUV）光源技术，打破此领域由美国企业垄断的局面，也为大陆的国产EUV曝光机 ...

而王国辉突然表态看好中芯国际，认为中国国内市场庞大且具备一定的“隔离效应”，中芯国际缺的是一台国产EUV光刻机，一旦有公司成功研发出EUV光刻设备，那么芯片战就会结束。 这背后是看到了国产EUV光刻机技术突破越来越近，中芯国际未来或有望实现跨越 ...

而王国辉突然表态看好中芯国际，认为中国国内市场庞大且具备一定的“隔离效应”，中芯国际缺的是一台国产EUV光刻机，一旦有公司成功研发出EUV ...

Key Laboratory for Micro-Nano Optoelectronic Devices of Ministry of Education, School of Physics and Electronics, Hunan University, Changsha 410082, China ...

U.S. Senate Minority Leader Charles Schumer said a final agreement has been reached to fund an $825 million federal computer chip research center at Albany NanoTech. Senate Minority Leader Charles ...

EUV光刻机的波长为13.5nm，而100KeV电子束的波长只有0.004nm，波长短使其在分辨率方面与EUV相比有绝对的优势，也使得电子束能够实现EUV光刻都实现不了 ...