The development of new ion sources, such as helium and neon ions, can provide higher resolution and reduced sample damage compared to traditional gallium ions. The integration of FIB with other ...

This technique utilizes controlled energetic ions to modify physical properties during deposition. The ion beam provides additional energy that increases atomic mobility on the surface ...

Kaufman and Robinson, Inc. (KRI®) engineers and manufactures broad beam ion and plasma products. Our products are vacuum-based process tools which interact with materials at the atomic level. Typical ...

Its technologies consist of metal organic chemical vapor deposition, advanced packaging lithography, wet etch and clean, laser annealing, ion beam, molecular beam epitaxy, wafer inspection ...