Extreme ultraviolet (EUV) lithography exposed resist patterns can exhibit excessive line edge roughness (LER) and line width roughness (LWR) due to random or shot noise. Increasing the EUV exposure ...

Trump's slew of education-focused orders also included another directive demanding an end to DEI ideology in schools, specifically the use of "disparate impact theory," on top of his previous ...

Ultrafast transmission electron microscopy (UTEM) is a valuable tool for investigating the intermediate stages of fast dynamic material processes. Here, we utilized single-shot imaging in UTEM to ...

Focused ion beam technology is pivotal in nanoscale materials processing, with a new EU report outlining its broad applications and potential for future breakthroughs in science and technology. Credit ...

The model permitted us to test various operating points of the thruster and obtain the radiation characteristics of the thruster with an active ion beam. This enabled preliminary checks to be made on ...

If a charged particle beam interacts with structures of different electric conductivity in a microelectronic circuit, this leads to local changes in the electric potential at its surface. In a ...

2000s: In the early 2000s, ultra-large-scale integration (ULSI) allowed billions of components to be integrated on one substrate. Next: The 2.5D and 3D integrated circuit (3D-IC) technologies ...

When Jack Kilby started working as an engineer at Dallas-based Texas Instruments (TI) in 1958, Texas was slugging through its worst drought on record. Since he hadn’t accrued enough personal time to ...