Several entities are developing new resists that promise to outperform the current materials. Resistless lithography. Paul Scherrer Institute is exploring EUV without using a resist. Dry resist. Lam ...

Resist sensitivity limits the throughput of an EUV exposure system, and is therefore a major contributor to the overall process cost. Irresistible Materials CEO Dinesh Bettadapur estimated that ...

Second, because EUV radiation is strongly absorbed by all materials — not only air — all optical elements in the imaging system must be reflective rather than refractive. Surfaces coated with ...

Dinesh Bettadapur brings a wealth of business experience and strategic vision to Irresistible Materials, having previously held leadership roles at ASML, Intel, and Lam Research, as well as ...

It initially applied EUV to a single layer of its third-generation ... The company has focused on refining resist materials, ...

BANGALORE, India, April 4, 2025 /PRNewswire/ -- EUV Photoresists Market is Segmented ... and research institutes drive continuous improvements in resist sensitivity, line edge roughness, and ...