Extreme ultraviolet (EUV) lithography is the next step in this trend. It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of photolithography ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

Many conclude from this that China could soon be producing chips using highly complex extreme ultraviolet (EUV) lithography technology. This would be a huge success for the country, as so far only ...

China is advancing in extreme ultraviolet (EUV) lithography, with a domestically developed system undergoing testing at Huawei's Dongguan facility, according to XFastest and Wccftech. Trial ...