Extreme ultraviolet (EUV) lithography is at the center of next-generation semiconductor manufacturing as it enables smaller ...

A typical optical system for lithography contains 11 components, so the total throughput of EUV light is only around ... laser-plasma source and zone-plate optics to focus the radiation.

For this, various compounds are processed in a chemical vapor deposition (CVD) system, which creates an EUV resist. Instead of spin coating, the resist is deposited on the wafers in the CVD system, ...

As mentioned above, the mirrors in the projection optics only reflect 72% of the incident EUV radiation at best. A typical projection lens assembly for a lithography system will include six or ...

On paper, the system resembles a traditional EUV system. Nikon’s 0.4 NA projection optics has a compact symmetric design with two reflections in the mirrors. “There’s no reticle scanning, only wafer ...

Figure 1. Comparison between conventional imaging using an imaging system (left) and “diffractive imaging” (right). In both cases, the sample needs to be illuminated by EUV light. However ...

The EUV is the first non-Cadillac model to offer GM’s Super Cruise active driving assistance system. FCW, AEB with pedestrian detection, LDW, and LKA, come standard, but BSW and RCTW are ...