Extreme ultraviolet (EUV) lithography is at the center of next-generation semiconductor manufacturing as it enables smaller ...

A typical optical system for lithography contains 11 components, so the total throughput of EUV light is only around ... laser-plasma source and zone-plate optics to focus the radiation.

ASML to install its High-NA EUV lithography tools in Imec's pilot production line to give research and development personnel ...

so any new laser source must integrate seamlessly with existing EUV stepper optics and infrastructure. The ability to use a different laser front-end while keeping much of the existing EUV system ...

Design and manufacture high-repetition-rate TE and TEA CO2 lasers for applications such as paint removal, wire stripping, lidar, EUV generations, high energy physics, THz light source, and ...

EUV lithography tools with projection optics featuring numerical aperture with higher than 0.7. "The customer interest for our [High-NA] system lab is high as this system will help both our Logic ...

Japanese optical technology leader Hoya Corporation recently admitted (PDF) to being affected by an “IT system incident affecting ... development of products for EUV lithography.

Figure 1. Comparison between conventional imaging using an imaging system (left) and “diffractive imaging” (right). In both cases, the sample needs to be illuminated by EUV light. However ...

The EUV is the first non-Cadillac model to offer GM’s Super Cruise active driving assistance system. FCW, AEB with pedestrian detection, LDW, and LKA, come standard, but BSW and RCTW are ...