ASML, a leading manufacturer of lithography systems, has announced its intention to deliver the industry's first EUV lithography systems to IC manufacturers in 2010. But developing a new ...

The first decade following the introduction of high-volume EUV lithography is expected to involve optimization of the process, reaching feature sizes below 10 nm. Beyond that, switching to a ...

nanoimprint lithography mechanically deforms the resist using a stamp or mold with the desired pattern. The process involves three main steps: resist application, imprinting, and development. First, ...

The first step is to coat a wafer with a layer ... which is seriously impressive for such a relatively simple setup. These e-beam lithography experiments follow on from [Zach]’s earlier research ...

This versatile technique enables the fabrication of complex structures on various substrates, including curved and flexible surfaces. Soft lithography fabrication diagram. First, a master mold is ...

First, the surface is coated in a thin film of light-sensitive resin ... The processing has been developed and demonstrated with an interferometric lithography tool. Ongoing work focuses on adapting ...