Sputtering targets are the source materials for the preparation of sputtered thin films. In particular, high-purity sputtering targets are used in the physical vapor deposition (PVD) process for the ...

In some applications, however, a reactive gas is purposely added to argon so that the deposited film is a chemical compound, and not the elemental target materials. Sputter deposition normally occurs ...

The team has just determined that its approach – involving plasma nitridation of the SiC surface, sputter deposition of SiO 2 ...

It is also configured with a cryogenic pumping system for a lower base pressure. Sputtering is a deposition process in which a plasma is used to ablate material from a metal or dielectric target. The ...

ATC Series Thin Film Deposition Systems are versatile coating tools that can be built in a wide variety of configurations to satisfy almost any requirement. These systems are built around AJA's unique ...

Researchers in China have fabricated a perovskite-silicon tandem solar cell that utilizes an indium oxide sputtering buffer ... arising from the electrode deposition process.

PVD techniques, such as sputtering and thermal evaporation, involve the physical vaporization of a ... CVD techniques, such as plasma-enhanced CVD (PECVD) and low-pressure CVD (LPCVD), enable the ...