Sputtering targets are the source materials for the preparation of sputtered thin films. In particular, high-purity sputtering targets are used in the physical vapor deposition (PVD) process for the ...

In some applications, however, a reactive gas is purposely added to argon so that the deposited film is a chemical compound, and not the elemental target materials. Sputter deposition normally occurs ...

The team has just determined that its approach – involving plasma nitridation of the SiC surface, sputter deposition of SiO 2 ...

It is also configured with a cryogenic pumping system for a lower base pressure. Sputtering is a deposition process in which a plasma is used to ablate material from a metal or dielectric target. The ...

ATC Series Thin Film Deposition Systems are versatile coating tools that can be built in a wide variety of configurations to satisfy almost any requirement. These systems are built around AJA's unique ...

Researchers in China have fabricated a perovskite-silicon tandem solar cell that utilizes an indium oxide sputtering buffer ... arising from the electrode deposition process.

Researchers at Shandong University in China have reported an enhancement-mode P-GaN/AlGaN/GaN metal-insulator-semiconductor ...

PVD techniques, such as sputtering and thermal evaporation, involve the physical vaporization of a ... CVD techniques, such as plasma-enhanced CVD (PECVD) and low-pressure CVD (LPCVD), enable the ...