Mask Optimization: The process of designing ... that uses mathematical optimization to design photomasks for lithography. Diffraction Near-Field (DNF): The region close to a diffracting object ...

Previous photolithography technologies used transmissive masks protected by a pellicle. For EUV lithography, however, the masks must be reflective and cannot have a protective pellicle as this ...

We have shown that this nonlinearity can be exploited to break the diffraction limit on feature size in single ... The processing has been developed and demonstrated with an interferometric ...

Nanostencil lithography (NSL) is a shadow-mask-based nanopatterning technique that allows for the direct deposition of materials through a stencil mask with nanoscale openings. It enables the ...

Etching the substrate using the patterned photoresist as a mask to create the final mold structure. Photolithography enables faster and more cost-effective mold fabrication compared to EBL but is ...

Reducing feature size, using photo lithography, is limited in part by diffraction of light. One way of overcoming the diffraction limitation is by using a mask design technique to correct for ...