ASML is the sole producer of cutting-edge EUV lithography machines for advanced 3nm chip manufacturing. How secure is that ...

EUV lithography tools consume such vast amounts of power because they rely on high-energy laser pulses to evaporate tiny tin ...

Chinese electronics giant Huawei is testing elements for an extreme ultraviolet (EUV) lithography machine at its Dongguan ...

Hertz et al. 4 have developed a soft-X-ray/EUV microscope in the water window that achieves sub-visible-light resolution. The microscope consists of a laser-plasma source and zone-plate optics to ...

The term EUV is not clearly defined. Other wavelengths also fall within this range of the spectrum, such as argon plasma laser sources that emit radiation at 46.9 nm. FZ Jülich is researching how ...

This uses a CO 2 laser of wavelength 10.6 μm to convert tin droplets into a plasma, which then emits bursts of broadband EUV radiation. According to Cymer, this set-up has twice the conversion ...

A more radical solution is to use a free-electron laser (FEL), where electrons travelling near the speed of light are manipulated to emit EUV radiation. The FEL process begins with a powerful ...

For the first time, scientists have 'photographed' a rare plasma instability, where high-energy electron beams form into spaghetti-like filaments. A new study, published in Physical Review Letters ...

China's EUV breakthrough: Huawei ... an alternative to ASML's laser-produced plasma (LPP). Experts, including a researcher from TSMC, believe that China's LDP method could be more efficient ...

The 193nm Teledyne CETAC Analyte Excite Excimer Laser Ablation System is capable of introducing almost any type of solid sample into the iCAP™ TQ ICP-MS. It is especially applicable to in-situ ...