Individual EUV photons have a lot of energy, but there aren’t very many of them. Feature roughness depends on the interaction ...

Extreme ultraviolet (EUV) lithography is at the center of next-generation semiconductor manufacturing as it enables smaller ...

Irresistible Materials, Ltd (IM), a leader in the development of novel resist materials for extreme ultraviolet (EUV) ...

High-NA EUV makes progress toward high-volume manufacturing while optical lithography sees continued advances.

Second, because EUV radiation is strongly absorbed by all materials — not only air — all optical elements in the imaging system must be reflective rather than refractive. Surfaces coated with ...

Micron Technology’s latest DRAM prototype highlights a sharp divergence from Samsung Electronics and SK Hynix in chip ...

Glancy Nicholls Architects (GNA) has promoted two longstanding members of staff to senior positions within the company.

A breakthrough introduced by Lam in 2020, dry resist extends the resolution, productivity, and yield of Extreme Ultraviolet (EUV) lithography, a pivotal technology used in the production of next ...

Belgian research lab Imec has revealed test results from 20nm pitch metal lines patterned using a single-exposure of high NA (numerical aperture) EUV lithography. Top-down SEM pictures of 20nm pitch ...