Extreme ultraviolet (EUV) lithography is at the center of next-generation semiconductor manufacturing as it enables smaller ...

ASML to install its High-NA EUV lithography tools in Imec's pilot production line to give research and development personnel ...

A typical optical system for lithography contains 11 components, so the total throughput of EUV light is only around ... laser-plasma source and zone-plate optics to focus the radiation.

EUV lithography tools with projection optics featuring numerical aperture with higher than 0.7. "The customer interest for our [High-NA] system lab is high as this system will help both our Logic ...

During the last quarter, Intel kept up a steady pace with the manufacture of 30,000 wafers.ts most recent high-NA EUV machines nearly ... This new system will underpin future PC and server chips ...

Design and manufacture high-repetition-rate TE and TEA CO2 lasers for applications such as paint removal, wire stripping, lidar, EUV generations, high energy physics, THz light source, and ...

Figure 1. Comparison between conventional imaging using an imaging system (left) and “diffractive imaging” (right). In both cases, the sample needs to be illuminated by EUV light. However ...